A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal = 4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.
申请公布号
EP2246737(B1)
申请公布日期
2015.12.02
申请号
EP20100008135
申请日期
2005.09.08
申请人
SHIN-ETSU CHEMICAL CO., LTD.;TOPPAN PRINTING CO., LTD.