发明名称 Light processing system
摘要 A system is provided for photo-processing of a material using incident light with an optical element that includes a plurality of concentric bands of optical prisms concentric around a focal axis. The system includes a target receiver positioned on the focal axis and holds the material to be photo-processed. The optical prisms concentrate incident light on the target receiver. The optical element may be formed substantially of acrylic formulated to pass UV radiation. The optical element may include anti-reflective additives in the acrylic. The optical prisms may be fresnel zones.
申请公布号 US9201228(B1) 申请公布日期 2015.12.01
申请号 US201414192832 申请日期 2014.02.27
申请人 发明人 Steinmeyer Donald Alan;Steinmeyer Eric Robert;Zagelow John Richard
分类号 G02B3/08;F24J2/06;G02B19/00;G02B5/04;G02B1/04 主分类号 G02B3/08
代理机构 Kolisch Hartwell, P.C. 代理人 Kolisch Hartwell, P.C.
主权项 1. A system for photo-processing of a material using incident light, the system comprising: a. a substantially transparent optical element, including a plurality of concentric bands of optical prisms concentric around a focal axis b. a target receiver positioned on the focal axis and configured to hold the material to be photo-processed, wherein the optical prisms concentrate incident light on the target receiver, and wherein the optical prisms receive and concentrate an input light onto the material to be photo-processed, the concentrated light incident on the material having greater than 60 times of at least the UV light of the input light.
地址