发明名称 |
Light processing system |
摘要 |
A system is provided for photo-processing of a material using incident light with an optical element that includes a plurality of concentric bands of optical prisms concentric around a focal axis. The system includes a target receiver positioned on the focal axis and holds the material to be photo-processed. The optical prisms concentrate incident light on the target receiver. The optical element may be formed substantially of acrylic formulated to pass UV radiation. The optical element may include anti-reflective additives in the acrylic. The optical prisms may be fresnel zones. |
申请公布号 |
US9201228(B1) |
申请公布日期 |
2015.12.01 |
申请号 |
US201414192832 |
申请日期 |
2014.02.27 |
申请人 |
|
发明人 |
Steinmeyer Donald Alan;Steinmeyer Eric Robert;Zagelow John Richard |
分类号 |
G02B3/08;F24J2/06;G02B19/00;G02B5/04;G02B1/04 |
主分类号 |
G02B3/08 |
代理机构 |
Kolisch Hartwell, P.C. |
代理人 |
Kolisch Hartwell, P.C. |
主权项 |
1. A system for photo-processing of a material using incident light, the system comprising:
a. a substantially transparent optical element, including a plurality of concentric bands of optical prisms concentric around a focal axis b. a target receiver positioned on the focal axis and configured to hold the material to be photo-processed, wherein the optical prisms concentrate incident light on the target receiver, and wherein the optical prisms receive and concentrate an input light onto the material to be photo-processed, the concentrated light incident on the material having greater than 60 times of at least the UV light of the input light. |
地址 |
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