Process for manufacturing of high surface area USP grade nano-anatase base

摘要

The present invention provides a novel manufacturing process for producing a high surface area USP grade titanium dioxide in the nano-anatase form. In a manufacturing method aspect of the present invention, a process of producing a high surface area USP grade TiO2 nano-anatase base is provided. The method involves steps of: a) phosphorus doping of the titanium hydrate obtained in hydrolysis of a titanium compound; b) drying and calcination of the doped paste, thereby producing a high surface area USP grade titanium dioxide in the anatase crystal form with nano-particles suitable for UV screens and cosmetics.

主权项

1. A novel process for manufacturing a high surface area USP grade TiO2 nano-anatase base comprising the steps of:
a) producing of a P-doped intermediate product by mixing together a clean titanium hydrate with a mineral acid containing phosphorus in the molecule as a phosphorus doping agent, wherein the introduced concentration of phosphorus is in the range from 0.1 to 0.5 weight percent on the TiO2 basis, and b) drying and calcination of the P-doped intermediate product, at the calcination temperature in the range from 650° C. to 850° C. and the time of calcination in the range from 1 to 24 hours, wherein the phosphorus concentration in the calcined product is between 0.1 and 0.5 weight percent based on TiO2 and the product of calcination is a high surface area TiO2 in nano-anatase crystal form meeting the USP grade quality wherein: i. loss on ignition at 800° C. for 2 hours is less than 1 weight percent, ii. specific surface area of the calcined product, determined from the nitrogen adsorption and desorption isotherms at 77 K (BET), is in the range from 20 to 75 m2/g, and iii. crystalline size determined from X-ray powder diffraction patterns (XRD) using the Scherrer equation is between 15 and 40 nm.