| 摘要 |
The present invention provides a focused ion beam device. The device comprises: a chamber which maintains vacuum; a focused ion beam source which is vertically arranged to the chamber and provides an ion beam progressing in -z axis direction; an electronic beam source which is slantly arranged in the chamber and provides an electronic beam, which progresses at a predetermined angle to the ion beam, onto x-z plane; and a scanning stage which rotates on x-z plane around the cross point of the ion beam and the electronic beam. |
