发明名称 Method of electroplating and depositing metal
摘要 A method of electroplating and depositing metal includes: providing an insulation substrate formed with conductive through holes; forming a first conductive layer on a first surface of the insulation substrate and forming a resist layer on a first portion of the first conductive layer, leaving a second portion of the first conductive layer uncovered by the resist layer as a to-be-plated area; disposing the insulation substrate in a first electroplating solution and depositing a first metal layer on the to-be-plated area; removing the resist layer and the portion of the first conductive layer; forming a second conductive layer on a second surface of the insulation substrate; forming a mask layer on the second conductive layer; disposing the insulation substrate in a second electroplating solution and depositing a second metal layer on the first metal layer of the to-be-plated area; and removing the mask layer and the second conductive layer.
申请公布号 US9204555(B2) 申请公布日期 2015.12.01
申请号 US201213623480 申请日期 2012.09.20
申请人 Viking Tech Corporation 发明人 Wei Shih-Long;Hsiao Shen-Li;Ho Chien-Hung
分类号 C25D5/02;H05K3/10;H05K3/24;H05K3/40;H05K3/42 主分类号 C25D5/02
代理机构 Davis & Bujold, P.L.L.C. 代理人 Davis & Bujold, P.L.L.C. ;Bujold Michael J.
主权项 1. A method, comprising: providing an insulation substrate formed with a plurality of conductive through holes; forming a first conductive layer on a first surface of the insulation substrate and forming a resist layer on a first portion of the first conductive layer, leaving a second portion of the first conductive layer uncovered by the resist layer as a to-be-plated area: disposing the insulation substrate in a first electroplating solution and depositing a first metal layer on the to-be-plated area, after depositing the first metal layer on the to-be-plated area, removing the resist layer and the first portion of the first conductive layer; after removing the resist layer and the first portion of the first conductive layer, forming a second conductive layer on a second surface of the insulation substrate that opposes the first surface, and forming a mask layer on the second conductive layer; disposing the insulation substrate in a second electroplating solution and depositing a second metal layer on the first metal layer of the to-be-plated area, and removing all of the mask layer and the second conductive layer.
地址 Hsinchu County TW