发明名称 |
Deposition apparatus providing improved replacing apparatus for deposition rate measuring sensor, and replacing method using the same |
摘要 |
A deposition apparatus includes a vacuum chamber, a sensor head located in the vacuum chamber and including a plurality of deposition rate measuring sensors, a sensor extractor coupled to the vacuum chamber and including a first vacuum maintaining valve, the sensor extractor being configured to extract one of the deposition rate measuring sensors to outside the vacuum chamber, and a sensor inserter coupled to the vacuum chamber and including a second vacuum maintaining valve, the sensor inserter being configured to insert one of the deposition rate measuring sensors into the sensor head. |
申请公布号 |
US9200361(B2) |
申请公布日期 |
2015.12.01 |
申请号 |
US201313874371 |
申请日期 |
2013.04.30 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Choi Eun-Sun |
分类号 |
C23C14/54 |
主分类号 |
C23C14/54 |
代理机构 |
Christie, Parker & Hale, LLP |
代理人 |
Christie, Parker & Hale, LLP |
主权项 |
1. A deposition apparatus comprising:
a vacuum chamber; a sensor head located in the vacuum chamber and comprising a plurality of deposition rate measuring sensors; a sensor extraction part coupled to the vacuum chamber and comprising a first vacuum maintaining valve, the sensor extraction part being configured to pass one of the deposition rate measuring sensors to outside the vacuum chamber; and a sensor insertion part coupled to the vacuum chamber and comprising a second vacuum maintaining valve, the sensor insertion part being configured to pass one of the deposition rate measuring sensors into the sensor head. |
地址 |
Yongin-si KR |