发明名称 |
Extended gate sensor for pH sensing |
摘要 |
A sensing device includes a substrate having a source region and a drain region formed therein. A gate structure is formed over the substrate and includes a gate dielectric and a gate conductor. The gate conductor is formed on the gate dielectric and disposed between the source region and the drain region. A dielectric layer is formed over the substrate and has a depth configured to form a well over the gate conductor. A gate extension is formed in contact with or as part of the gate conductor and including a conductive material covering one or more surfaces of the well. |
申请公布号 |
US9201041(B2) |
申请公布日期 |
2015.12.01 |
申请号 |
US201313967006 |
申请日期 |
2013.08.14 |
申请人 |
GLOBALFOUNDRIES INC |
发明人 |
Dalton Timothy J.;Jagtiani Ashish V.;Muralidhar Ramachandran;Zafar Sufi |
分类号 |
G01N27/414 |
主分类号 |
G01N27/414 |
代理机构 |
Tutunjian & Bitetto, P.C. |
代理人 |
Tutunjian & Bitetto, P.C. |
主权项 |
1. A method for forming a pH sensing device, comprising:
forming a gate structure over a substrate including a gate dielectric, a gate conductor and a dummy material, the gate conductor being formed on the gate dielectric and disposed between a source region and a drain region; forming a dielectric layer over the substrate and the gate structure, wherein the dielectric layer is disposed at least laterally spaced from the dummy material; planarizing the dielectric layer to expose the dummy material; removing the dummy material to form a well; and forming a gate extension in contact with the gate conductor and including a conductive material covering one or more surfaces of the well. |
地址 |
Grand Cayman KY |