METHOD OF FORMING PHOTO-CURABLE PATTERN

摘要

The present invention relates to a method for forming a photocurable pattern and, more specifically, to a method for forming a photocurable pattern by applying a photosensitive resin composition to at least one surface of a substrate, and exposing the surface, to which the photosensitive resin composition is applied, to light of multi-wavelengths. The exposure is performed so that a light amount integral value of light having a wavelength of j-ray (from 300 nm to 340 nm) of the light becomes 5 to 20% of a light amount integral value of light having a wavelength of i-ray (greater than 340 nm and less than or equal to 380 nm) of the light. The photosensitive resin composition includes a photopolymerization initiator having an absorption wavelength in a range of 325 to 340 nm, thereby improving adhesion of a pattern to form a fine pattern. Therefore, high resolution can be realized.