| 摘要 |
The present invention relates to salt, an acid generator, a photoresist composition, and a method for forming a photoresist pattern, comprising salt represented by chemical formula (I). X represents an oxygen atom, a sulfur atom, or -N(SO_2R^5)-; R^5 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group, or a C6-C12 aromatic hydrocarbon group; Ar represents a C6-C36 aromatic hydrocarbon group or a C4-C36 heteroaromatic hydrocarbon group; R^1 and R^2 independently represent a hydrogen atom, a hydroxyl group, or a C1-C12 hydrocarbon group; m and n independently represent 1 or 2; R^3 and R^4 independently represent a hydrogen atom or a C1-C12 hydrocarbon group, and R^3 and R^4 are capable of forming a ring by binding or R^3 or R^4 is capable of forming a ring with Ar; and A^- represents an organic anion having an acid-liable group, an organic anion having an base-liable group, and an organic anion having an acid-liable group and a base-liable group. |
