发明名称 |
Method For Drying Wafer Substrates And Wafer Holder For Conduction Of The Method |
摘要 |
A method for drying wafer substrates immersed into a liquid, and wafer holder for conduction of the method. The method involves holding substrates on a wedge-shaped edge of an elongated wafer holder, the substrates being upright on the wafer holder; transferring the substrates and the wedge-shaped edge of the wafer holder from the liquid to a gas space with a vapor which does not condense on the substrates and which lowers surface tension of liquid residues adhering to the substrates, wherein the removal of liquid residues between the wafer substrates and the wafer holder through a slot in the middle of the wedge-shaped edge of the wafer holder. |
申请公布号 |
SG10201502914Y(A) |
申请公布日期 |
2015.11.27 |
申请号 |
SG10201502914Y |
申请日期 |
2015.04.14 |
申请人 |
SILTRONIC AG |
发明人 |
KÜHNSTETTER, ALBERT;EDMAIER, WALTER;HOHL, GEORG-FRIEDRICH |
分类号 |
|
主分类号 |
|
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|