发明名称 TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
摘要 Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
申请公布号 US2015342016(A1) 申请公布日期 2015.11.26
申请号 US201514817408 申请日期 2015.08.04
申请人 ASML Netherlands B.V. 发明人 Rafac Robert J.;Tao Yezheng
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
代理机构 代理人
主权项 1. (canceled)
地址 Velhoven NL