发明名称 DEVICE FOR PROVIDING A FLOW OF PLASMA
摘要 A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell for forming the gaseous plasma. The plasma cell comprises an inlet for receiving gas from a source and an outlet for discharging active species generated therein. A dielectric substrate preferably made of a polyimide encloses around a flow path for gas conveyed from the inlet to the outlet and an electrode is formed on the dielectric substrate for energising gas along the flow path to form active species. A protective lining is located on an inner surface of the dielectric substrate for resisting reaction of the active species with the material of the dielectric substrate. An earth electrode comprising an electrode formed on a dielectric substrate substantially surrounds and at least partially overlaps the plasma cell.
申请公布号 US2015340207(A1) 申请公布日期 2015.11.26
申请号 US201314650960 申请日期 2013.12.16
申请人 LINDE AKTIENGESELLSCHAFT 发明人 Holbeche Thomas Bickford
分类号 H01J37/32;C23C16/50 主分类号 H01J37/32
代理机构 代理人
主权项 1. A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region, the device comprising: at least one plasma cell for forming said gaseous plasma for treating the treatment region, the at least one plasma cell comprising: an inlet for receiving gas from a source and an outlet for discharging active species generated in the cell;a dielectric substrate enclosed around a flow path for gas conveyed from the inlet to the outlet;an electrode formed on or in the dielectric substrate for energising gas along the flow path to form active species; anda protective coating made of a dielectric formed on an inner surface of the dielectric substrate for protecting the dielectric substrate from reaction with the active species,the device further comprising: an earth electrode comprising a dielectric substrate and an electrode formed on or in the dielectric substrate, wherein the earth electrode substantially surrounds and at least partially overlaps the at least one plasma cell.
地址 Munich DE