发明名称 III-V Group Compound Devices with Improved Efficiency and Droop Rate
摘要 A photonic device includes: a first-type III-V group layer; a second-type III-V group layer formed on the first-type III-V group layer; and a multi-quantum well layer disposed between the first-type III-V group layer and the second-type III-V group layer; wherein: the multi-quantum well layer comprises a plurality of active layers interleaved with a plurality of barrier layers such that each barrier layer is separated from adjacent barrier layers by a respective one of the active layer; a material of each barrier layer comprises semiconductor compound devoid of Al element; the barrier layers comprises a first group layers between the first-type III-V group layer and the second-type III-V group layer and a second group layers between the second-type III-V group layer and the first group layers, and a thickness of each barrier layer of the first group layers is greater than that of each barrier layer of the second group layers; and the barrier layers of the first group layers comprise uniform thickness.
申请公布号 US2015340553(A1) 申请公布日期 2015.11.26
申请号 US201514817367 申请日期 2015.08.04
申请人 Epistar Corporation 发明人 Li Zhen-Yu;Lin Hon-Way;Lin Chung-Pao;Hsia Hsing-Kuo;Kuo Hao-Chung
分类号 H01L33/06;H01L33/12;H01L33/14;H01L33/00;H01L33/32 主分类号 H01L33/06
代理机构 代理人
主权项 1. A photonic device, comprising: a first-type III-V group layer; a second-type III-V group layer formed on the first-type III-V group layer; and a multi-quantum well layer disposed between the first-type III-V group layer and the second-type III-V group layer; wherein: the multi-quantum well layer comprises a plurality of active layers interleaved with a plurality of barrier layers such that each barrier layer is separated from adjacent barrier layers by a respective one of the active layer; a material of each barrier layer comprises semiconductor compound devoid of Al element; the barrier layers comprises a first group layers between the first-type III-V group layer and the second-type III-V group layer and a second group layers between the second-type III-V group layer and the first group layers, and a thickness of each barrier layer of the first group layers is greater than that of each barrier layer of the second group layers; and the barrier layers of the first group layers comprise uniform thickness.
地址 Hsinchu City TW