发明名称 INTEGRATED CIRCUIT INCLUDING A SEMICONDUCTOR-ON-INSULATOR REGION AND A BULK REGION
摘要 A structure comprises a semiconductor substrate, a semiconductor-on-insulator region and a bulk region. The semiconductor-on-insulator region comprises a first semiconductor region, a dielectric layer provided between the semiconductor substrate and the first semiconductor region, and a first transistor comprising an active region provided in the first semiconductor region. The dielectric layer provides electrical isolation between the first semiconductor region and the semiconductor substrate. The bulk region comprises a second semiconductor region provided directly on the semiconductor substrate.
申请公布号 US2015340380(A1) 申请公布日期 2015.11.26
申请号 US201514817734 申请日期 2015.08.04
申请人 GLOBALFOUNDRIES Inc. 发明人 Flachowsky Stefan;Kessler Matthias;Hoentschel Jan
分类号 H01L27/12;H01L29/94;H01L29/06;H01L29/778;H01L29/16;H01L29/20;H01L29/861;H01L29/78 主分类号 H01L27/12
代理机构 代理人
主权项 1. A structure, comprising: a semiconductor substrate; a semiconductor-on-insulator region, said semiconductor-on-insulator region comprising a first semiconductor region that contains a first active region, a dielectric layer provided between said semiconductor substrate and said first semiconductor region, and a first transistor positioned in and above said first active region in said first semiconductor region, said dielectric layer providing electrical isolation between said first semiconductor region and said semiconductor substrate; and a bulk region, said bulk region comprising a second semiconductor region provided directly on said semiconductor substrate.
地址 Grand Cayman KY