THIN FILM DEPOSITION METHOD AND DEPOSITION DEVICE

摘要

Provided is a method for low-cost deposition of a durable thin film. This deposition method uses a deposition device (1). This device (1) includes a vacuum chamber (11) in which a substrate (100) is arranged at the bottom, a vacuum pump (15) which evacuates the chamber (11), a storage container (23) which is provided outside of the chamber (11) and which stores a film deposition solution (21), and a nozzle (17) which at one end has a discharge unit (19) which can discharge the film deposition solution (21). As the film deposition solution (21), a solution is used which contains two or more materials. The film deposition solution (21) is discharged onto the substrate in an environment in which the pressure is set on the basis of the vapor pressure of each of the materials making up said solution.