DEPOSITION APPARATUS FOR DEPOSITION OF A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE

摘要

A deposition apparatus (300) for deposition of a material on a substrate is provided. The deposition apparatus (300) includes a first processing chamber (310) and a second processing chamber (320); at least one first deposition source (311) in the first processing chamber (310) and at least one second deposition source (321) in the second processing chamber (320); and at least one first shield device (350). The at least one first shield device (350) is configured to be moveable at least between a first position and a second position, wherein the at least one first shield device (350) is configured to shield the at least one first deposition source (311) when the at least one first shield device (350) is in the first position. The at least one first shield device (350) is configured to be moveable at least between the first processing chamber (310) and the second processing chamber (320).