| 发明名称 |
BRUSH CLEANING METHOD |
| 摘要 |
A method for cleaning a brush includes inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers. The method further includes rotating the brush in contact with the surface of the first plate. |
| 申请公布号 |
US2015335146(A1) |
申请公布日期 |
2015.11.26 |
| 申请号 |
US201514817264 |
申请日期 |
2015.08.04 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HUANG Fu-Ming;CHEN Liang-Guang;KUO Han-Hsin;TSAI Chi-Ming;PENG He Hui |
| 分类号 |
A46B17/06;A46B15/00;B08B1/00;B08B6/00 |
主分类号 |
A46B17/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for cleaning a brush comprising:
inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers; and rotating the brush in contact with the surface of the first plate. |
| 地址 |
Hsinchu TW |
