| 摘要 |
An ultraviolet mask, which comprises a black matrix photoresist layer (302) covering a display area of a color filter substrate (301). An ultraviolet mask manufacturing method, which comprises: covering a black matrix photoresist material (302) onto a color filter substrate (301), selectively removing the black matrix photoresist material (302) distributed in a non-display area of the substrate (301) while retaining the black matrix photoresist material (302) distributed in a display area of the substrate (301), and, solidifying the black matrix photoresist material (302) distributed in the display area to form the ultraviolet mask. By employing a CF manufacturing process instead of an existing array process, only a color filter black photoresist yellow-light manufacturing process is required to complete the manufacturing of the ultraviolet mask, compared with the array manufacturing process, reduced are manufacturing processes of one instance of film formation, one instance of etching, and one instance of separation, the manufacturing process is indirect, manufacturing time is short, and costs are reduced. |
