| 发明名称 |
COMPOSITION FOR FORMING SILICA BASED LAYER, AND METHOD FOR MANUFACTURING SILICA BASED LAYER |
| 摘要 |
A composition for forming a silica based layer and a method for manufacturing a silica based layer, the composition including a silicon-containing compound, the silicon-containing compound including a hydrogenated polysilazane moiety, a hydrogenated polysiloxazane moiety, or a combination thereof, and a solvent, wherein a number of particles of the silicon-containing compound in the composition and having a particle diameter of about 0.2 μm to about 1 μm is less than or equal to about 10/ml. |
| 申请公布号 |
US2015337168(A1) |
申请公布日期 |
2015.11.26 |
| 申请号 |
US201414561996 |
申请日期 |
2014.12.05 |
| 申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
BAE Jin-Hee;KWAK Taek-Soo;LEE Han-Song;CHO Youn-Jin;HWANG Byeong-Gyu;KIM Bo-Sun;PARK Sae-Mi;PARK Eun-Su;SEO Jin-Woo;LIM Wan-Hee;JANG Jun-Young;HAN Kwen-Woo |
| 分类号 |
C09D183/04;B05D1/00;B05D3/00;C09D183/16 |
主分类号 |
C09D183/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for forming a silica based layer, the composition comprising:
a silicon-containing compound, the silicon-containing compound including a hydrogenated polysilazane moiety, a hydrogenated polysiloxazane moiety, or a combination thereof, and a solvent, wherein a number of particles of the silicon-containing compound in the composition and having a particle diameter of about 0.2 μm to about 1 μm is less than or equal to about 10/ml. |
| 地址 |
Yongin-si KR |
