X-RAY GENERATION TARGET, EXAMINATION SYSTEM, CONTROL DEVICE, CONTROL METHOD, AND CONTROL PROGRAM

摘要

An X-ray generation target (112) is provided with a substrate in one embodiment. Also, in the one embodiment, the X-ray generation target is provided with a plurality of first X-ray nano-targets (112f) that are disposed on the substrate, and that have a first size. Additionally, in the one embodiment, the X-ray generation target is provided with second X-ray nano-targets (112g) that are disposed on the substrate at positions specified by the first X-ray nano-targets (112f) and that have a second size, which is smaller than the first size.