发明名称 BUFFER LAYER FILM-FORMING METHOD AND BUFFER LAYER
摘要 The present invention relates to a method for film-forming a buffer layer to be used for a solar cell, said buffer layer being to be disposed between a light absorbing layer and a transparent conductive film. Specifically, in this buffer layer film-forming method, a solution (4) is atomized, said solution containing zinc and aluminum as metal raw materials of the buffer layer. Then, a substrate (2) disposed in the atmosphere is heated. Then, the atomized solution is sprayed to the substrate being heated.
申请公布号 WO2015177899(A1) 申请公布日期 2015.11.26
申请号 WO2014JP63544 申请日期 2014.05.22
申请人 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION 发明人 SHIRAHATA TAKAHIRO;ORITA HIROYUKI;HIRAMATSU TAKAHIRO;KOBAYASHI HIROSHI
分类号 H01L31/0256;H01L31/18 主分类号 H01L31/0256
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