ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method that excels in roughness performance such as line width roughness, uniformity in a local pattern dimension, and exposure latitude, exhibits little dependence of a pattern size on a developing time, and can suppress film reduction by development, and an actinic ray-sensitive or radiation-sensitive resin composition to be used for the above method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (P) having a repeating unit (a1) represented by general formula (I) or (II) by 20 mol% or more with respect to the whole repeating units in the resin (P); and a compound (B) that generates an acid by irradiation with actinic rays or radiation. In formulae (I) and (II), Rarepresents an alicyclic hydrocarbon group having a valence of (n+1); and Rarepresents an alicyclic hydrocarbon group having a valence of (p×2+1).