发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN |
摘要 |
Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.); |
申请公布号 |
US2015338736(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
US201514751669 |
申请日期 |
2015.06.26 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAWABATA Takeshi;TAKIZAWA Hiroo;SHIBUYA Akinori;GOTO Akiyoshi;KOJIMA Masafumi;KATO Keita |
分类号 |
G03F7/004;C07C309/17;C07D333/48;C07D335/02;C07D327/06;C07C309/12;C07D217/06;G03F7/20;C07D333/76 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
1. An actinic-ray- or radiation-sensitive resin composition comprising a resin (A) and any of compounds (B) of general formula (I) below, in which Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group. |
地址 |
Tokyo JP |