| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma reactor for removing contaminant contained in a process gas, provided on an exhaust route of the process gas heading for a vacuum pump from a process chamber.SOLUTION: The plasma reactor includes: a tubular insulator inside of which a process gas passes; a first ground electrode connected to a front end of an insulator heading for a process chamber; a second ground electrode, connected to a rear end of an insulator heading for a vacuum pump, provided with a facing part that faces an inside center of the insulator along a transfer direction of the process gas; and a driving electrode, fixed at an outer surface of the insulator, that receives an AC or RF driving voltage by being connected to a power supply. |
