发明名称 |
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD |
摘要 |
According to an embodiment of the present invention, a substrate processing device comprises: a chamber for transferring a substrate through a passage formed on one side thereof, the chamber providing an internal space, in which processes related to the substrate are conducted, and the chamber having a supply port formed on the opposite side to the passage so as to supply gas towards the substrate; an auxiliary susceptor, which is installed in the internal space, which has a shape corresponding to that of the internal space, and which has an opening formed therein; and a main susceptor, which is inserted/installed in the opening, which can rotate while the substrate is placed thereon, and which heats the substrate. |
申请公布号 |
WO2015178687(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
WO2015KR05066 |
申请日期 |
2015.05.20 |
申请人 |
EUGENE TECHNOLOGY CO., LTD. |
发明人 |
HYON, JUN-JIN;KIM, HAI-WON;SHIN, CHANG-HUN;SONG, BYOUNG-GYU;KIM, KYONG-HUN;KIM, YONG-KI;SHIN, YANG-SIK;KIM, CHANG-DOL;KIM, EUN-DUCK |
分类号 |
H01L21/683;H01L21/02;H01L21/205 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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