TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME

摘要

[Problem] To provide: a top-layer membrane formation composition able to form a pattern having superior pattern shape and roughness in a method for forming a pattern by means of extremely ultraviolet ray exposure; and a method for forming a pattern using same. [Solution] The top-layer membrane formation composition is characterized by comprising an aqueous solvent and an aromatic compound having an aromatic hydroxyl group. The method forms a pattern by means of applying the composition on a resist surface and exposing/developing the result. The composition may further include a binder.