发明名称 |
Novolak Resin Containing Hexafluoroisopropanol Group, Method for Producing Same, and Composition of Same |
摘要 |
Disclosed is a novolak resin containing a repeating unit represented by the general formula (1). R1is a hydrogen atom or an alkyl group which is C1-4 straight-chain or C3-4 branched-chain, and some or all hydrogen atoms in the alkyl group may be replaced with a fluorine atom; R2 is a hydrogen atom, a phenyl group, an alkyl group which is C1-10 straight-chain or C3-10 branched-chain, or an alkyl group having a C3-10 cyclic structure, and some or all hydrogen atoms in the phenyl group and the alkyl group may be replaced with fluorine atoms; each of a and b is independently an integer of 1-3, and these are defined as 2≦a+b≦4; and d is an integer of 0-2. This novolak resin has high dissolution rate in the alkaline development solution in addition to the heat resisting property which is a property of phenolic resin.; |
申请公布号 |
US2015337077(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
US201314655161 |
申请日期 |
2013.12.25 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
NAKATSUJI Junya;YAMANAKA Kazuhiro |
分类号 |
C08G61/12;C09D163/00 |
主分类号 |
C08G61/12 |
代理机构 |
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代理人 |
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主权项 |
1. A novolak resin containing a repeating unit represented by the general formula (1): wherein R1 is a hydrogen atom or an alkyl group which is C1-4 straight-chain or C3-4 branched-chain, and a part of or all hydrogen atoms in the alkyl group may be replaced with a fluorine atom; R2 is a hydrogen atom, a phenyl group, an alkyl group which is C1-10 straight-chain or C3-10 branched-chain, or an alkyl group having a C3-10 cyclic structure, and a part of or all hydrogen atoms in the phenyl group and the alkyl group may be replaced with a fluorine atom; each of a and b is independently an integer of 1-3, and these are defined as 2≦a+b≦4; and d is an integer of 0-2. |
地址 |
Yamaguchi JP |