| 主权项 |
1. A method comprising:
a) creating a modified surface on a substrate by applying a surface agent to the substrate, the modified surface characterized by a first surface energy; b) applying energy to the modified surface to form an imaged-modified surface having at least an imaged portion and a non-imaged portion, with the imaged portion having a second surface energy; c) contacting the imaged-modified surface with a block copolymer composition to form a selected pattern based upon at least one of the first surface energy and the second surface energy,wherein the block copolymer comprises:
1) a first block derived from the polymerization of Monomer1, wherein X is H or methyl, R is selected from the group consisting of: C1-C8 alkyl and partially fluorinated alkyl groups, optionally substituted with hydroxyl or protected hydroxyl groups and optionally containing ether linkages; and C3-C8 cycloalkyl groups; and 2) a second block covalently attached to the first block, wherein the second block is derived from the polymerization of Monomer2, wherein Ar is a pyridyl group, a phenyl group, or a phenyl group comprising substituents selected from the group consisting of hydroxyl, protected hydroxyl, acetoxy, C1-C4 alkoxy groups, phenyl, substituted phenyl, —SiR′3, and —OC(O)OR′, where R′ is selected from the group consisting of C1-C8 alkyl groups,and wherein:
Monomer1 and Monomer2 are selected such that the difference between the total surface energy values of a homopolymer of Monomer1 and a homopolymer of Monomer2 is greater than 10 dynes/cm; the first block comprises 5-95 wt % of the block copolymer, the molecular weight of the block copolymer is between 5,000 and 250,000, and the composition comprises less than 5 wt % of the homopolymer of Monomer1 and less than 5 wt % of the homopolymer of Monomer2. |
