| 摘要 |
A dry etching device, comprising: an etching cavity and an air extraction system arranged at the bottom of the etching cavity, wherein the air extraction system comprises an air extraction passage with several air extraction ports and air exhaust ports, an air extractor, and controllable valves correspondingly installed on various air extraction ports. Also disclosed is a dry etching method, comprising the steps of: putting a workpiece to be etched on a base platform in an etching cavity; selecting an air extraction manner according to a working procedure to be conducted, wherein the air extraction manner comprises a cyclical operating mode and a noncyclic operating mode; and conducting the working procedure of dry etching processing while conducting air extraction in the cyclical operating mode or the noncyclic operating mode. The dry etching device can further improve the process uniformity of dry etching and improve the manufacturing uniformity of array substrates, thereby improving the product quality and the yield of products, reducing the limit of the process uniformity to the product design and improving the product design space. |
