MANUFACTURING METHOD OF FUNCTIONAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a functional element capable of suppressing a defect such as a defective shape in the functional element.SOLUTION: A manufacturing method of a functional element includes: a seed layer formation step of forming a seed layer 20 on a substrate 10; a mask layer formation step of forming a mask layer 40 having opening portions 41 on the seed layer 20; an oxide film formation step of forming oxide films 50 obtained by applying oxidation treatment of the mask layer 40 with a film thickness of surface roughness of the mask layer 40 within a range of Ra to 100 nm at least at a part of an exposed surface of the mask layer 40; a seed layer etching step of performing etching of the seed layer 20 subsequent to formation of the oxide film 50; and a substrate etching step of performing etching of the substrate 10 subsequent to the etching of the seed layer 20.