发明名称 AMBIPOLAR VERTICAL FIELD EFFECT TRANSISTOR
摘要 Various examples are provided for ambipolar vertical field effect transistors (VFETs). In one example, among others, an ambipolar VFET includes a gate layer; a source layer that is electrically percolating and perforated; a dielectric layer; a drain layer; and a semiconducting channel layer. The semiconducting channel layer is in contact with at least a portion of the source layer and at least a portion of the dielectric layer and the source layer and the semiconducting channel layer form a gate voltage tunable charge injection barrier. Another example includes an ambipolar vertical field effect transistor including a dielectric surface treatment layer. The semiconducting channel layer is in contact with at least a portion of the source layer and at least a portion of the dielectric surface treatment layer and where the source layer and the semiconducting channel layer form a gate voltage tunable charge injection barrier.
申请公布号 US2015340631(A1) 申请公布日期 2015.11.26
申请号 US201314648608 申请日期 2013.11.26
申请人 University of Florida Research Foundation, Inc. 发明人 Rinzler Andrew Gabriel;Liu Bo;McCarthy Mitchell Austin
分类号 H01L51/05;H01L27/092;H01L29/739;H01L27/28;H01L51/10 主分类号 H01L51/05
代理机构 代理人
主权项 1. An ambipolar vertical field effect transistor, comprising: a gate layer; a source layer that is electrically percolating and perforated; a dielectric layer disposed between the gate layer and the source layer; a drain layer; and a semiconducting channel layer disposed between the source layer and the drain layer, where the semiconducting channel layer is in contact with at least a portion of the source layer and at least a portion of the dielectric layer, and where the source layer and the semiconducting channel layer form a gate voltage tunable charge injection barrier.
地址 Gainesville FL US
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