| 发明名称 |
NOVEL SURFACTANTS WITH LOWER CMC, AND SURFACTANT SYSTEMS AND DETERGENTS CONTAINING SAID SURFACTANTS |
| 摘要 |
The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms. |
| 申请公布号 |
US2015337237(A1) |
申请公布日期 |
2015.11.26 |
| 申请号 |
US201514813565 |
申请日期 |
2015.07.30 |
| 申请人 |
Henkel AG & Co. KGaA ;Studiengesellschaft Kohle mbH |
发明人 |
Kropf Christian;Bode Nicole;Bedrunka Danuta;Rinaldi Roberto;Estevez Rivera Hebert Jesus |
| 分类号 |
C11D1/22;C11D1/37;C11D1/831;C11D1/29;C07C309/42;C11D1/24 |
主分类号 |
C11D1/22 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. Surfactants of formula (I) in which R1 stands for —H or —CH3, R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl radical containing 8 to 20 C atoms, or —SO3−X+, X+ stands for a monovalent cation or the nth part of an n-valent cation, with the condition that
exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+ andexactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms. |
| 地址 |
Duesseldorf DE |
