| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a material to be used for a method of forming a coating pattern by which a coating pattern can be easily formed.SOLUTION: The material for forming a resist coating film is to be used in a method for forming a coating pattern which comprises: forming a resist pattern 2 on a support 1 by using a resist composition containing an acid generator that can generate an acid by exposure and/or heat; applying a material for forming a resist coating film thereon to form a coating film 3; exposing and/or baking the resist pattern 2 to generate an acid; and developing the coating film 3 so as to form a pattern the surface of which is coated with a coating film 4. The material comprises: a silicon-containing polymer that can induce a crosslinking reaction by an action of an acid; and an organic solvent that dissolves the silicon-containing polymer. The silicon-containing polymer is a silicone resin, which has an epoxy group-containing group and/or an ethylenically unsaturated double bond-containing group in a side chain and has a hydrogen atom directly bonded to a silicon atom.</p> |
