| 摘要 |
The purpose of the present invention is to optimize use efficiency of inert gas for dilution, capable of preventing the explosion of exhaust gas at an outlet of a vacuum pump of a decompression processing device. The gas is the combination of halogen retardant gas and specific combustible gas (CH_4, CH_3F, CH_2F_2), having the probability of explosion. A plasma processing device includes a main control part (42) managing an exhaust gas processing situation of an exhaust gas processing part (40) through a dilution controller (45). The exhaust gas processing part (40) comprises a pre-treatment device (48) connected to an outlet of the vacuum pump (36) through an exhaust pipe (46); a dilution gas source (52) connected to the exhaust pipe (46) through a dilution gas supply pipe (50) around the outlet of the vacuum pump (36); an MFC (54) and an opening valve (55), installed in a middle part of the dilution gas supply pipe (50); a gas sensor (56) attached to the exhaust pipe (46) under an end (node N) of the dilution gas supply pipe; and the dilution controller (45) controlling the MFC (54). |
