| 发明名称 |
HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION |
| 摘要 |
The present invention relates to a hardmask composition and a method for forming patterns using the hardmask composition and, more specifically, to a hardmask composition comprising a polymer including a part represented by chemical formula 1 and a solvent. [Chemical formula 1]: -A-B- In the chemical formula 1, A and B are the same as defined in the specification. |
| 申请公布号 |
KR20150131867(A) |
申请公布日期 |
2015.11.25 |
| 申请号 |
KR20140059252 |
申请日期 |
2014.05.16 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
NAM, YOUN HEE;KIM, MI YOUNG;PARK, YOU JUNG;KIM, YUN JUN;KIM, HEA JUNG;MOON, JOON YOUNG;SONG, HYUN JI;LEE, CHUNG HEON;CHOI, YOO JEONG |
| 分类号 |
G03F7/11;G03F7/20;H01L21/027 |
主分类号 |
G03F7/11 |
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