| 摘要 |
The present invention is to efficiently clean a collection line of a substrate liquid processing device. The substrate liquid processing device includes: at least one processing part processing a substrate with processing liquid; a storage tank storing the processing liquid; a circulation line extracting the processing liquid from the storage tank, and returning the processing liquid to the storage tank; a branch supply line branched from the circulation line to supply the processing liquid to the processing part; a collection line returning the processing liquid, supplied from the processing part to the substrate, to the storage tank; a distribution line connecting the circulation line to the collection line; and an opening/closing valve installed on the distribution line, and opened when the collection line is being cleaned. When cleaning liquid is circulated in the circulation line, part of the cleaning liquid is induced from the distribution line to the collection line in order to clean the collection line. |
