| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a scanning charged-particle microscope in which distortion of measurement, even of an insulator pattern, in the field of view can be suppressed by suppressing the impact of charging due to primary charged-particle beam irradiation during photographing, and suppressing change in the detection rate of secondary charged-particles. <P>SOLUTION: In the scanning charged-particle microscope which forms the image of a scanning area by performing the scanning for the two-dimensional area on a specimen 8 so as to reverse the line scanning direction of a charged-particle beam 4 alternately, the distance between the scan lines of charged-particle beam 4 is adjusted based on the charging characteristics of the specimen 8 or the uniformity of lightness in the field of view of the specimen 8, when the specimen 8 is irradiated with the charged-particle beam 4. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
