| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of obtaining a pattern having excellent line width roughness (LWR).SOLUTION: A salt included in the resist composition is represented by formula (I). [In the formula, each of Rand Rrepresents a hydrogen atom or a 1-12C hydrocarbon, Rrepresents a 2-12C hydrocarbon or Rand Rare bound to each other, thereby forming a 3-20C ring together with carbon atoms. Each of Rand Rrepresents a hydrogen atom, a fluorine atom or a 1-6C perfluoroalkyl group. Xrepresents a divalent 1-17C hydrocarbon group, a hydrogen atom included in the divalent hydrocarbon group may be substituted with a fluorine atom, and -CH- included in the divalent hydrocarbon group may be replaced with -O- or -CO-. Wrepresents a 4C or 5C heterocyclic ring. Arepresents an organic cation]. |
