发明名称 パターン形成方法およびパターン形成装置
摘要 <p>A nozzle N which moves in a scan direction Ds along a surface Wf of a substrate W discharges an application liquid which contains a photo-curing material, and a light emitter E moving as if to follow the nozzle N irradiates light (UV light for instance) upon the application liquid. Arriving at an application end position, the nozzle N stops discharging the application liquid and retracts in a direction away from the substrate surface Wf. Meanwhile, the light emitter E keeps moving in the scan direction Ds, thereby irradiating even the terminating end of the application liquid with the light without fail.</p>
申请公布号 JP5819621(B2) 申请公布日期 2015.11.24
申请号 JP20110067041 申请日期 2011.03.25
申请人 发明人
分类号 B05D1/26;B05C5/02;B05C9/12;B05D3/06 主分类号 B05D1/26
代理机构 代理人
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