发明名称 基板処理方法、この基板処理方法を実行するためのコンピュータプログラムが記録された記録媒体、および基板処理装置
摘要 A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate.
申请公布号 JP5820709(B2) 申请公布日期 2015.11.24
申请号 JP20110262678 申请日期 2011.11.30
申请人 東京エレクトロン株式会社 发明人 南 輝 臣;田 中 暁;永 松 辰 也;鈴 木 啓 之;川 渕 洋 介;平 山 司;松 木 勝 文
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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