| 摘要 |
<p>Disclosed is a chemical solution for forming a water-repellent protective film (10) on at least the surfaces of concaved parts in a fine concave-convex pattern (2) that is formed on the surface of a wafer (1) containing a silicon atom in at least a part thereof, during the washing of the wafer (1). The chemical solution comprises a silicon compound (A) represented by the general formula: R1 aSi(H)bX4-a-b and an acid (A), wherein the acid (A) comprises at least one compound selected from the group consisting of trimethylsilyltrifluoroacetate, trimethylsilyltrifluoromethanesulfonate, dimethylsilyl- trifluoroacetate, dimethylsilyltrifluoromethanesulfonate, butyldimethylsilyltrifluoroacetate, butyldimethyl- silyltrifluoromethanesulfonate, hexyldimethylsilyl- trifluoroacetate, hexyldimethylsilyltrifluoro- methanesulfonate, octyldimethylsilyltrifluoroacetate, octyldimethylsilyltrifluoromethanesulfonate, decyldimethyl- silyltrifluoroacetate and decyldimethylsilyl- trifluoromethanesulfonate.</p> |
