发明名称 Lithographic apparatus comprising a support for holding an object, and a support for use therein
摘要 A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
申请公布号 US9195150(B2) 申请公布日期 2015.11.24
申请号 US201314377141 申请日期 2013.02.04
申请人 ASML Netherlands B.V. 发明人 Cadee Theodorus Petrus Maria;Banine Vadim Yevgenyevich;Zaal Koen Jacobus Johannes Maria;Badie Ramin;Singh Harmeet
分类号 G03B27/58;G03F7/20;H01L21/687 主分类号 G03B27/58
代理机构 Sterne, Kessler, Goldstein & Fox, P.L.L.C. 代理人 Sterne, Kessler, Goldstein & Fox, P.L.L.C.
主权项 1. A lithographic apparatus comprising a support for holding an object, wherein: the support has a first part with a first upper main surface facing the object when the support is holding the object; the support has a second part with a second upper main surface facing a first bottom main surface of the first part; the second upper main surface and the first bottom main surface are spaced apart from each other by means of multiple discrete support walls; the support has a plurality of burls extending from the first upper main surface; a first one of the plurality of burls has a first top surface operative to contact the object when the support is holding the object; a second one of the plurality of burls has a second top surface operative to contact the object when the support is holding the object; the first top surface has a first position relative to the second upper main surface and has a first orientation relative to the second main surface; the second top surface has a second position relative to the second upper main surface and has a second orientation relative to the second upper main surface; the lithographic apparatus comprises a controller that is configured to perform at least one of: control the first position and the second position independently of one another when the support is holding the object; andcontrol the first orientation and the second orientation independently of one another when the support is holding the object.
地址 Veldhoven NL