发明名称 |
Lithographic apparatus comprising a support for holding an object, and a support for use therein |
摘要 |
A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable. |
申请公布号 |
US9195150(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201314377141 |
申请日期 |
2013.02.04 |
申请人 |
ASML Netherlands B.V. |
发明人 |
Cadee Theodorus Petrus Maria;Banine Vadim Yevgenyevich;Zaal Koen Jacobus Johannes Maria;Badie Ramin;Singh Harmeet |
分类号 |
G03B27/58;G03F7/20;H01L21/687 |
主分类号 |
G03B27/58 |
代理机构 |
Sterne, Kessler, Goldstein & Fox, P.L.L.C. |
代理人 |
Sterne, Kessler, Goldstein & Fox, P.L.L.C. |
主权项 |
1. A lithographic apparatus comprising a support for holding an object, wherein:
the support has a first part with a first upper main surface facing the object when the support is holding the object; the support has a second part with a second upper main surface facing a first bottom main surface of the first part; the second upper main surface and the first bottom main surface are spaced apart from each other by means of multiple discrete support walls; the support has a plurality of burls extending from the first upper main surface; a first one of the plurality of burls has a first top surface operative to contact the object when the support is holding the object; a second one of the plurality of burls has a second top surface operative to contact the object when the support is holding the object; the first top surface has a first position relative to the second upper main surface and has a first orientation relative to the second main surface; the second top surface has a second position relative to the second upper main surface and has a second orientation relative to the second upper main surface; the lithographic apparatus comprises a controller that is configured to perform at least one of:
control the first position and the second position independently of one another when the support is holding the object; andcontrol the first orientation and the second orientation independently of one another when the support is holding the object. |
地址 |
Veldhoven NL |