发明名称 Method for purifying chlorosilanes
摘要 The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R′ (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR′)4-x (wherein R and R′ are each an alkyl group having 1 to 20 carbon atoms).
申请公布号 US9193597(B2) 申请公布日期 2015.11.24
申请号 US201013386926 申请日期 2010.07.07
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Nagai Naoki;Shimizu Takaaki;Uehara Katsuhiro;Kubota Tohru
分类号 C01B33/107 主分类号 C01B33/107
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method for purifying a chlorosilane, the method comprising: mixing an aromatic aldehyde, a first component comprising an alkoxysilane, and a second component comprising a chlorosilane.
地址 Tokyo JP