发明名称 |
Method for purifying chlorosilanes |
摘要 |
The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R′ (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR′)4-x (wherein R and R′ are each an alkyl group having 1 to 20 carbon atoms). |
申请公布号 |
US9193597(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201013386926 |
申请日期 |
2010.07.07 |
申请人 |
Shin-Etsu Chemical Co., Ltd. |
发明人 |
Nagai Naoki;Shimizu Takaaki;Uehara Katsuhiro;Kubota Tohru |
分类号 |
C01B33/107 |
主分类号 |
C01B33/107 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method for purifying a chlorosilane, the method comprising:
mixing an aromatic aldehyde, a first component comprising an alkoxysilane, and a second component comprising a chlorosilane. |
地址 |
Tokyo JP |