| 摘要 |
Provided are a method for manufacturing a finishing polishing pad, and the polishing pad, allowing few polishing flaws and being capable of forming a stable film, by means of a polishing pad having a polyurethane resin film as a polishing layer on a film-formation substrate, the polishing pad characterized in that the polishing layer comprises a polishing slurry holding section and a polishing slurry flow channel section, the polishing slurry holding section having air bubbles and the polishing slurry flow channel section not having air bubbles, and the polishing layer also contains hydrophobic spherical silica in the amount of 0.5 to 6% of the total polyurethane resin film mass. |
