发明名称 INSULATION GATE TYPE FIELD EFFECT TRANSISTOR UTILIZING NITRIDE SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To solve the problem that, when negative constant charge is introduced to a channel region of a nitride semiconductor, a threshold voltage increases such that normally-off can be implemented, but ON resistance may increase.SOLUTION: A channel region 12a opposite to a gate electrode 2 via a gate insulator 4 has a structure where a negative constant charge introduction region 14 and a non-introduction region 15 alternately appear when observed in a direction ((y) direction) where the gate electrode 2 extends. When a voltage is not applied to the gate electrode 2, a depletion layer extends in the (y) direction from the negative constant charge introduction region 14, and the non-introduction region 15 is depleted. When a voltage is applied to the gate electrode 2, the depletion layer is shrunk and channel resistance is reduced. A gate voltage for shrinking the depletion layer rises, thereby implementing normally-off. An electron moves in the non-introduction region 15 with high mobility, such that ON resistance is low.
申请公布号 JP2015211151(A) 申请公布日期 2015.11.24
申请号 JP20140092447 申请日期 2014.04.28
申请人 TOYOTA CENTRAL R&D LABS INC;DENSO CORP 发明人 NARITA TETSUO;KIKUTA DAIGO;TOMITA KAZUYOSHI;ITO KENJI;KOYAMA KAZUHIRO;HIGUCHI YASUSHI
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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