Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol

摘要

Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film.

主权项

1. A composition for forming an underlayer film for a solvent-developable resist, the composition comprising:
a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof; and a solvent;wherein:
the silicon atom is present in a ratio of 0.1 to 40% by mol based on a total amount of silicon atoms in the composition; the hydrolysable organosilane is an organosilane of Formula (1):
R1aR2bSi(R3)4-(a+b)  Formula (1) where: R1 is a monovalent organic group containing a protected aliphatic alcohol group and is bonded to the silicon atom in Formula (1) though a Si—C bond: R2 is an alkyl group, an aryl group, a halogenated alkyl group, a halogenated aryl group, an alkenyl group, or a monovalent organic group having an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, or a cyano group, and is bonded to the silicon atom in Formula (1) through a Si—C bond; R3 is an alkoxy group, an acyloxy group, or a halogen atom; a is an integer of 1 or 2: b is an integer of 0 or 1; and a+b is an integer of 1 or 2; and the organic group containing the protected aliphatic alcohol group is an organic group of Formula (2):
—R4—O—R5  Formula (2) where: R4 is a C1-10 alkylene group; and R5 is a methyl group to which one or more divalent groups are bonded, the one or more divalent groups being selected from the group consisting of a C1-10 alkylene group and an ether group.