PHOTOSENSITIVE COMPOSITION WHICH HAS EXCELLENT LIGHT ABSORPTION AND IS SUITABLE FOR FINE PATTERN FORMATION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition which has excellent light absorption and is suitable for fine pattern formation.SOLUTION: A photosensitive composition is used in forming a hardened part for formation of an intended patter by a collective exposure method of exposing through a UV lamp and a photomask or a direct drawing method using light from a UV lamp or a short-wavelength laser beam and developing unhardened parts with an alkali aqueous solution. Preferably, the dry coating film before exposure has a thickness of 25 μm, absorbances for wavelengths of 355 nm and 375 nm of 1.2-1.8 and an absorbance for the wavelength of 405 nm of 0.6 or higher. A hardened product of the composition and a dry film obtained by applying the composition onto a carrier film and drying are also provided.