发明名称 インプリント装置、及びそれを用いた物品の製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an imprint apparatus in which occurrence of defects in a resin patterning part can be suppressed while reducing bubbles being mixed into the patterning part. <P>SOLUTION: The imprint apparatus 1 forms a pattern of a resin 52 on a substrate 5 by pressing an uncured resin 52 on the substrate 5 and a mold 3 against each other. The mold 3 is in the shape of a box which has a planar part 3a, in the center part on the side facing the substrate 5, on which an uneven pattern 3c is formed in contact with the resin 52, and a wall 3b on the outer peripheral side. The imprint apparatus 1 has a mold holding device 4 which has a holding part 24 for attracting and holding a vertical surface 3d of the wall 3b. The mold holding device 4 has a mold deformation mechanism 50 which deforms the shape between the center part and the wall 3b of the planar part 3a. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5822597(B2) 申请公布日期 2015.11.24
申请号 JP20110174600 申请日期 2011.08.10
申请人 发明人
分类号 H01L21/027;B29C59/02;G11B5/84 主分类号 H01L21/027
代理机构 代理人
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