二ホウ化マグネシウム薄膜の製造方法,申请号JP20120168301-传众专利搜索

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发明名称	二ホウ化マグネシウム薄膜の製造方法
摘要
申请公布号	JP5819788(B2)	申请公布日期	2015.11.24
申请号	JP20120168301	申请日期	2012.07.30
申请人		发明人
分类号	C30B29/10;C01B35/04;C01G1/00;C30B23/08;C30B33/02;H01B12/06;H01B13/00;H01L39/24	主分类号	C30B29/10
代理机构		代理人
主权项
地址

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