发明名称 Surface potential measuring apparatus and surface potential measuring method
摘要 An apparatus for measuring a surface potential of an object on an underlying structure is disclosed. A relatively-moving mechanism moves a probe and a second support member relative to each other until the probe faces a reference structure on the second support member, an electric potential measuring device measures the surface potential of the reference structure through the probe, the controller calibrates the electric potential measuring device such that a measured value of the surface potential of the reference structure becomes 0, the relatively-moving mechanism moves the probe and a first support member relative to each other until the probe faces the object on the first support member after the calibration, and the electric potential measuring device measures the surface potential of the object through the probe.
申请公布号 US9194903(B2) 申请公布日期 2015.11.24
申请号 US201414197101 申请日期 2014.03.04
申请人 Ebara Corporation 发明人 Ishibashi Tomoatsu
分类号 G01N27/60;G01R29/12;H01L21/66;G01R31/28 主分类号 G01N27/60
代理机构 Baker & Hostetler LLP 代理人 Baker & Hostetler LLP
主权项 1. An apparatus for measuring a surface potential of an object on an underlying structure, the apparatus comprising: a probe; an electric potential measuring device configured to measure the surface potential through the probe; a first support member configured to support the underlying structure; a second support member configured to support a reference structure having the same construction as the underlying structure; a ground wire configured to ground the first support member and the second support member; a relatively-moving mechanism configured to move the probe and the first support member relative to each other and to move the probe and the second support member relative to each other; and a controller configured to control operations of the electric potential measuring device and the relatively-moving mechanism, the controller being configured to command the relatively-moving mechanism to move the probe and the second support member relative to each other until the probe faces the reference structure on the second support member,command the electric potential measuring device to measure the surface potential of the reference structure through the probe,calibrate the electric potential measuring device such that a measured value of the surface potential of the reference structure becomes 0,command the relatively-moving mechanism to move the probe and the first support member relative to each other until the probe faces the object after the calibration, andcommand the electric potential measuring device to measure the surface potential of the object through the probe.
地址 Tokyo JP